The influence of composition on the solid state properties of anodic films on Al-Ta alloys

Risultato della ricerca: Conference contribution

Abstract

Microelectronics is very important for almost all kinds of technology evolutions in the past four decades. In this area, the dielectrics science occupies a prominent place in providing the dominant technology in integrated capacitors or gate insulators.
Lingua originaleEnglish
Titolo della pubblicazione ospiteASST 2015 VII Aluminium Surface Science & Technology
Numero di pagine1
Stato di pubblicazionePublished - 2015

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microelectronics
capacitors
insulators
solid state

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title = "The influence of composition on the solid state properties of anodic films on Al-Ta alloys",
abstract = "Microelectronics is very important for almost all kinds of technology evolutions in the past four decades. In this area, the dielectrics science occupies a prominent place in providing the dominant technology in integrated capacitors or gate insulators.",
keywords = "Al-Ta alloys, anodic films, solid state properties",
author = "{Di Quarto}, Francesco and {Di Franco}, Francesco and Andrea Zaffora and Monica Santamaria",
year = "2015",
language = "English",
booktitle = "ASST 2015 VII Aluminium Surface Science & Technology",

}

TY - GEN

T1 - The influence of composition on the solid state properties of anodic films on Al-Ta alloys

AU - Di Quarto, Francesco

AU - Di Franco, Francesco

AU - Zaffora, Andrea

AU - Santamaria, Monica

PY - 2015

Y1 - 2015

N2 - Microelectronics is very important for almost all kinds of technology evolutions in the past four decades. In this area, the dielectrics science occupies a prominent place in providing the dominant technology in integrated capacitors or gate insulators.

AB - Microelectronics is very important for almost all kinds of technology evolutions in the past four decades. In this area, the dielectrics science occupies a prominent place in providing the dominant technology in integrated capacitors or gate insulators.

KW - Al-Ta alloys

KW - anodic films

KW - solid state properties

UR - http://hdl.handle.net/10447/189667

M3 - Conference contribution

BT - ASST 2015 VII Aluminium Surface Science & Technology

ER -