Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering

Roberto Macaluso, Andrea Zaffora, Zebbar, Boughelout, Bensouilah, Zohour, Kechouane, Aida, Trari

Risultato della ricerca: Article

6 Citazioni (Scopus)

Abstract

ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases(Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partialpressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperatureof 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD),optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect)measurements. The results indicate that by varying the oxygen pressure in the depositionchamber, the films show a precise and well defined photoluminescence emissions for each rangeof pressure covering almost the entire visible domain (UV, UV-Violet, Violet, Blue, and Red) withhigh intensities. Moreover, the deposited films have different defects levels. The XRD analysisindicates that the films are well grown along the c-axis peak, but with different crystallinequality. Optical measurements reveal a high transmission, up to 90%, in the spectral regionbetween 400 and 2500 nm and a large variation of the optical band gap (3.16–4.34 eV). As anapplication of the deposited ZnO films, the photo-catalytic degradation of a synthetic solution ofRhodamine B (RhB) poured on a ZnO thin film was successfully achieved and an elimination rateof 38% was obtained after exposing the film to solar light for 3 h.
Lingua originaleEnglish
pagine (da-a)77-85
Numero di pagine9
RivistaOptik
Volume174
Stato di pubblicazionePublished - 2018

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rhodamine B
Photocatalysis
rhodamine
Sputtering
sputtering
direct current
Crystalline materials
Oxygen
Photoluminescence
photoluminescence
X ray diffraction
Thin films
Argon
Optical band gaps
Hall effect
oxygen plasma
oxygen
Substrates
thin films
Light transmission

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cita questo

Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering. / Macaluso, Roberto; Zaffora, Andrea; Zebbar; Boughelout; Bensouilah; Zohour; Kechouane; Aida; Trari.

In: Optik, Vol. 174, 2018, pag. 77-85.

Risultato della ricerca: Article

Macaluso, R, Zaffora, A, Zebbar, Boughelout, Bensouilah, Zohour, Kechouane, Aida & Trari 2018, 'Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering', Optik, vol. 174, pagg. 77-85.
Macaluso, Roberto ; Zaffora, Andrea ; Zebbar ; Boughelout ; Bensouilah ; Zohour ; Kechouane ; Aida ; Trari. / Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering. In: Optik. 2018 ; Vol. 174. pagg. 77-85.
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abstract = "ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases(Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partialpressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperatureof 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD),optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect)measurements. The results indicate that by varying the oxygen pressure in the depositionchamber, the films show a precise and well defined photoluminescence emissions for each rangeof pressure covering almost the entire visible domain (UV, UV-Violet, Violet, Blue, and Red) withhigh intensities. Moreover, the deposited films have different defects levels. The XRD analysisindicates that the films are well grown along the c-axis peak, but with different crystallinequality. Optical measurements reveal a high transmission, up to 90{\%}, in the spectral regionbetween 400 and 2500 nm and a large variation of the optical band gap (3.16–4.34 eV). As anapplication of the deposited ZnO films, the photo-catalytic degradation of a synthetic solution ofRhodamine B (RhB) poured on a ZnO thin film was successfully achieved and an elimination rateof 38{\%} was obtained after exposing the film to solar light for 3 h.",
author = "Roberto Macaluso and Andrea Zaffora and Zebbar and Boughelout and Bensouilah and Zohour and Kechouane and Aida and Trari",
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T1 - Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering

AU - Macaluso, Roberto

AU - Zaffora, Andrea

AU - Zebbar, null

AU - Boughelout, null

AU - Bensouilah, null

AU - Zohour, null

AU - Kechouane, null

AU - Aida, null

AU - Trari, null

PY - 2018

Y1 - 2018

N2 - ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases(Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partialpressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperatureof 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD),optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect)measurements. The results indicate that by varying the oxygen pressure in the depositionchamber, the films show a precise and well defined photoluminescence emissions for each rangeof pressure covering almost the entire visible domain (UV, UV-Violet, Violet, Blue, and Red) withhigh intensities. Moreover, the deposited films have different defects levels. The XRD analysisindicates that the films are well grown along the c-axis peak, but with different crystallinequality. Optical measurements reveal a high transmission, up to 90%, in the spectral regionbetween 400 and 2500 nm and a large variation of the optical band gap (3.16–4.34 eV). As anapplication of the deposited ZnO films, the photo-catalytic degradation of a synthetic solution ofRhodamine B (RhB) poured on a ZnO thin film was successfully achieved and an elimination rateof 38% was obtained after exposing the film to solar light for 3 h.

AB - ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases(Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partialpressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperatureof 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD),optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect)measurements. The results indicate that by varying the oxygen pressure in the depositionchamber, the films show a precise and well defined photoluminescence emissions for each rangeof pressure covering almost the entire visible domain (UV, UV-Violet, Violet, Blue, and Red) withhigh intensities. Moreover, the deposited films have different defects levels. The XRD analysisindicates that the films are well grown along the c-axis peak, but with different crystallinequality. Optical measurements reveal a high transmission, up to 90%, in the spectral regionbetween 400 and 2500 nm and a large variation of the optical band gap (3.16–4.34 eV). As anapplication of the deposited ZnO films, the photo-catalytic degradation of a synthetic solution ofRhodamine B (RhB) poured on a ZnO thin film was successfully achieved and an elimination rateof 38% was obtained after exposing the film to solar light for 3 h.

UR - http://hdl.handle.net/10447/308861

M3 - Article

VL - 174

SP - 77

EP - 85

JO - Optik

JF - Optik

SN - 0030-4026

ER -