Radiation induced generation of non-bridging oxygen hole center in silica: Intrinsic and extrinsic processes

The generation of non-bridging oxygen hole center („Si–O) was investigated in a wide variety of natural (fused quartz) and synthetic silica samples exposed to different c- and b-irradiation doses by looking at its optical bands. We distinguish two different generation processes: intrinsic associated with the cleavage of Si–O bond and characterized by a sublinear law and extrinsic due to the conversion of OH precursor characterized by a growth curve with a saturating tendency. The interplay between the two processes and the role of H are discussed.