Radiation effects in nitride read-only memories

Fabio Principato, Tiziano Schillaci, Antonio Marino, Celi, Giarusso, Lombardo, Celi, Mur, Celi, Corso, Michael Lisiansky, Yakov Roizin, Libertino, Mur, Felix Palumbo, Giuseppe Cannella

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2 Citazioni (Scopus)


We report on the influence of different types of radiation on the nitride read-only memories (NROM ).The memory cells were irradiated by light ions (Boron), X-rays and c-rays. Memory transistor parameters,such as threshold voltage and subthreshold drain leakage were studied as a function of the accumulatedradiation dose and compared to the as-programmed (-erased) devices parameters. Their timeevolution was registered in the range from few hours up to 5 months after the irradiation. The NROM cells showed good radiation robustness up to high accumulated doses. Sufficient program margin (differenceof threshold voltage in the programmed state and the read-out voltage level) remained after c or Xirradiation for absorbed doses exceeding 50 krad(Si) and 100 krad(Si), respectively. For Boron irradiation,the programmed devices remained stable up to the fluence of 1011 ions/cm2 (equivalent to 1 Mrad(Si) of TID tolerance
Lingua originaleEnglish
pagine (da-a)1857-1860
Numero di pagine4
Stato di pubblicazionePublished - 2010


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Safety, Risk, Reliability and Quality
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cita questo

Principato, F., Schillaci, T., Marino, A., Celi, Giarusso, Lombardo, Celi, Mur, Celi, Corso, Lisiansky, M., Roizin, Y., Libertino, Mur, Palumbo, F., & Cannella, G. (2010). Radiation effects in nitride read-only memories. MICROELECTRONICS RELIABILITY, 50, 1857-1860.