Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication

Claudio Arnone; Marco Barbera; Giuseppe Lullo; Ugo Lo Cicero; null Perinatil; null Varisco; null Collura; null Barbera

Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication

Claudio Arnone, Marco Barbera, Giuseppe Lullo, Ugo Lo Cicero, Perinatil, Varisco, Collura, Barbera

Risultato della ricerca: Other › peer review

Abstract

We have investigated the electroplating process to deposit thick uniform films of tin on a Ge wafer coated with Spin-OnGlass, in order to fabricate the absorbers for Ge microcalorimeter arrays. Here we discuss some technological details andpropose two alternative metal bilayer to be used as seed for the electroplating.

Lingua originale	English
Pagine	112-114
Numero di pagine	3
Stato di pubblicazione	Published - 2009

All Science Journal Classification (ASJC) codes

???subjectarea.asjc.3100.3100???

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title = "Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication",

abstract = "We have investigated the electroplating process to deposit thick uniform films of tin on a Ge wafer coated with Spin-OnGlass, in order to fabricate the absorbers for Ge microcalorimeter arrays. Here we discuss some technological details andpropose two alternative metal bilayer to be used as seed for the electroplating.",

author = "Claudio Arnone and Marco Barbera and Giuseppe Lullo and {Lo Cicero}, Ugo and Perinatil and Varisco and Collura and Barbera",

year = "2009",

language = "English",

pages = "112--114",

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TY - CONF

T1 - Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication

AU - Arnone, Claudio

AU - Barbera, Marco

AU - Lullo, Giuseppe

AU - Lo Cicero, Ugo

AU - Perinatil, null

AU - Varisco, null

AU - Collura, null

AU - Barbera, null

PY - 2009

Y1 - 2009

N2 - We have investigated the electroplating process to deposit thick uniform films of tin on a Ge wafer coated with Spin-OnGlass, in order to fabricate the absorbers for Ge microcalorimeter arrays. Here we discuss some technological details andpropose two alternative metal bilayer to be used as seed for the electroplating.

AB - We have investigated the electroplating process to deposit thick uniform films of tin on a Ge wafer coated with Spin-OnGlass, in order to fabricate the absorbers for Ge microcalorimeter arrays. Here we discuss some technological details andpropose two alternative metal bilayer to be used as seed for the electroplating.

UR - http://hdl.handle.net/10447/49096

M3 - Other

SP - 112

EP - 114

ER -

Planar Technology for NDT-Ge X-Ray Microcalorimeters: Absorber Fabrication

Abstract

All Science Journal Classification (ASJC) codes

Altri file e collegamenti

Fingerprint

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