Optical, structural, and morphological characterisation of epitaxial ZnO filas grown by pulsed-laser deposition

Claudio Cali', Roberto Macaluso, Mauro Mosca, Nicolas Grandjean, Nicolay, Eric Feltin, Butté, Martin

Risultato della ricerca: Article

14 Citazioni (Scopus)

Abstract

We report on ZnO epitaxial growth by pulsed-laser deposition (PLD) on different substrates, such as quartz, sapphire, and GaN template. Approximately 1 μm-thick films were grown under different substrate temperatures and background oxygen conditions. X-ray diffraction analysis indicated preferential growth along the c-axis direction with a full-width at half maximum (FWHM) of the rocking curve as narrow as 230 arcs in the case of the GaN template. Low-temperature photoluminescence showed A-excitonic emission near 3.36 eV and a FWHM of D0XA emission as small as 2.89 meV at 9 K. Atomic force microscope measurements showed that roughness as low as 18 nm could be obtained. These results prove that PLD is a low-cost technique suitable to grow heteroepitaxial ZnO layers with excellent properties in terms of luminescence, crystallinity and morphology
Lingua originaleEnglish
pagine (da-a)55-59
Numero di pagine5
RivistaThin Solid Films
Volume539
Stato di pubblicazionePublished - 2013

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Pulsed laser deposition
Full width at half maximum
pulsed laser deposition
templates
Quartz
Aluminum Oxide
Substrates
Epitaxial growth
Thick films
Sapphire
X ray diffraction analysis
thick films
Luminescence
crystallinity
Photoluminescence
sapphire
Microscopes
roughness
quartz
arcs

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cita questo

Optical, structural, and morphological characterisation of epitaxial ZnO filas grown by pulsed-laser deposition. / Cali', Claudio; Macaluso, Roberto; Mosca, Mauro; Grandjean, Nicolas; Nicolay; Feltin, Eric; Butté; Martin.

In: Thin Solid Films, Vol. 539, 2013, pag. 55-59.

Risultato della ricerca: Article

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T1 - Optical, structural, and morphological characterisation of epitaxial ZnO filas grown by pulsed-laser deposition

AU - Cali', Claudio

AU - Macaluso, Roberto

AU - Mosca, Mauro

AU - Grandjean, Nicolas

AU - Nicolay, null

AU - Feltin, Eric

AU - Butté, null

AU - Martin, null

PY - 2013

Y1 - 2013

N2 - We report on ZnO epitaxial growth by pulsed-laser deposition (PLD) on different substrates, such as quartz, sapphire, and GaN template. Approximately 1 μm-thick films were grown under different substrate temperatures and background oxygen conditions. X-ray diffraction analysis indicated preferential growth along the c-axis direction with a full-width at half maximum (FWHM) of the rocking curve as narrow as 230 arcs in the case of the GaN template. Low-temperature photoluminescence showed A-excitonic emission near 3.36 eV and a FWHM of D0XA emission as small as 2.89 meV at 9 K. Atomic force microscope measurements showed that roughness as low as 18 nm could be obtained. These results prove that PLD is a low-cost technique suitable to grow heteroepitaxial ZnO layers with excellent properties in terms of luminescence, crystallinity and morphology

AB - We report on ZnO epitaxial growth by pulsed-laser deposition (PLD) on different substrates, such as quartz, sapphire, and GaN template. Approximately 1 μm-thick films were grown under different substrate temperatures and background oxygen conditions. X-ray diffraction analysis indicated preferential growth along the c-axis direction with a full-width at half maximum (FWHM) of the rocking curve as narrow as 230 arcs in the case of the GaN template. Low-temperature photoluminescence showed A-excitonic emission near 3.36 eV and a FWHM of D0XA emission as small as 2.89 meV at 9 K. Atomic force microscope measurements showed that roughness as low as 18 nm could be obtained. These results prove that PLD is a low-cost technique suitable to grow heteroepitaxial ZnO layers with excellent properties in terms of luminescence, crystallinity and morphology

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JO - Thin Solid Films

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