O2 diffusion in amorphous SiO2 nanoparticles probed by outgassing

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Abstract

An experimental study of the O2 diffusion process in nanoparticles of amorphous SiO2 in the temperature range from 98 to 157 °C was carried out by Raman and photoluminescence techniques. We studied O2 diffusion in high purity silica nanoparticles with a mean diameter of 14, 20, and 40 nm detecting the outgassing of molecules trapped during the manufacturing. The kinetics of diffusion is well described for all the investigated nanoparticles by the Fick’s equation proving its applicability to nanoscale systems. The diffusion coefficient features an Arrhenius law temperature dependence in the explored temperature range, and the diffusion coefficient values are in good agreement with extrapolation of Arrhenius law from higher temperature studies
Lingua originaleEnglish
pagine (da-a)11351-11356
Numero di pagine6
RivistaJOURNAL OF PHYSICAL CHEMISTRY. C
Volume116
Stato di pubblicazionePublished - 2012

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outgassing
Degassing
Nanoparticles
nanoparticles
coefficients
Extrapolation
Silicon Dioxide
extrapolation
purity
manufacturing
Silica
silicon dioxide
Temperature
Molecules
Kinetics
kinetics
molecules
temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Physical and Theoretical Chemistry
  • Energy(all)

Cita questo

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abstract = "An experimental study of the O2 diffusion process in nanoparticles of amorphous SiO2 in the temperature range from 98 to 157 °C was carried out by Raman and photoluminescence techniques. We studied O2 diffusion in high purity silica nanoparticles with a mean diameter of 14, 20, and 40 nm detecting the outgassing of molecules trapped during the manufacturing. The kinetics of diffusion is well described for all the investigated nanoparticles by the Fick’s equation proving its applicability to nanoscale systems. The diffusion coefficient features an Arrhenius law temperature dependence in the explored temperature range, and the diffusion coefficient values are in good agreement with extrapolation of Arrhenius law from higher temperature studies",
keywords = "nanosilica, diffusion, raman spectroscopy",
author = "Roberto Boscaino and Gelardi, {Franco Mario} and Simonpietro Agnello and Giuseppe Iovino",
year = "2012",
language = "English",
volume = "116",
pages = "11351--11356",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
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T1 - O2 diffusion in amorphous SiO2 nanoparticles probed by outgassing

AU - Boscaino, Roberto

AU - Gelardi, Franco Mario

AU - Agnello, Simonpietro

AU - Iovino, Giuseppe

PY - 2012

Y1 - 2012

N2 - An experimental study of the O2 diffusion process in nanoparticles of amorphous SiO2 in the temperature range from 98 to 157 °C was carried out by Raman and photoluminescence techniques. We studied O2 diffusion in high purity silica nanoparticles with a mean diameter of 14, 20, and 40 nm detecting the outgassing of molecules trapped during the manufacturing. The kinetics of diffusion is well described for all the investigated nanoparticles by the Fick’s equation proving its applicability to nanoscale systems. The diffusion coefficient features an Arrhenius law temperature dependence in the explored temperature range, and the diffusion coefficient values are in good agreement with extrapolation of Arrhenius law from higher temperature studies

AB - An experimental study of the O2 diffusion process in nanoparticles of amorphous SiO2 in the temperature range from 98 to 157 °C was carried out by Raman and photoluminescence techniques. We studied O2 diffusion in high purity silica nanoparticles with a mean diameter of 14, 20, and 40 nm detecting the outgassing of molecules trapped during the manufacturing. The kinetics of diffusion is well described for all the investigated nanoparticles by the Fick’s equation proving its applicability to nanoscale systems. The diffusion coefficient features an Arrhenius law temperature dependence in the explored temperature range, and the diffusion coefficient values are in good agreement with extrapolation of Arrhenius law from higher temperature studies

KW - nanosilica, diffusion, raman spectroscopy

UR - http://hdl.handle.net/10447/63273

M3 - Article

VL - 116

SP - 11351

EP - 11356

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

ER -