Nonstoichiometric silica mask to fabricate reverse proton-exchange waveguides in lithium niobate crystals

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Abstract

Producing channel waveguides requires a photolithographic mask, but the standard technique of using thermally evaporated metal films for proton exchange has proved to be unsuitable for withstanding the rather aggressive process of reverse proton exchange.We report the fabrication of a nonstoichiometric silica mask by ion-plating plasma-assisted deposition. This mask is strong enough to resist both direct and reverse proton exchange and is also compatible with anisotropic dry etching for patterning the mask and with electric field poling. Our technique is a practical alternative to the use of SiO2 sputtered masks.
Lingua originaleEnglish
pagine (da-a)940-943
RivistaAPPLIED OPTICS
Volume43, No 4
Stato di pubblicazionePublished - 2004

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All Science Journal Classification (ASJC) codes

  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

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