Multilevel pattern generation by GaN laser lithography: an application to beam shaper fabrication

Claudio Arnone, Giuseppe Lullo, Riccardo Leto, Riccardo Leto

Risultato della ricerca: Conference contribution

5 Citazioni (Scopus)

Abstract

The new GaN lasers represent a unique combination of compactness, reliability, energy efficiency, and short wavelength. With respect to the previous state of the art in direct laser write lithography, based on gas lasers, this is resulting in a breakthrough, and is opening the way to real desktop micropatterning. The field of diffractive optics can immediately benefit by the availability of a new breed of pattern generators, based on such sources, mainly for fast turnaround device development. This paper presents the technical advantages involved in the use of 405 nm GaN lasers for one-step multilevel patterning. Beam modulation, exposure control and overall process strategy are discussed. In order to evaluate the effectiveness of the new solution, a sample fabrication of beam shapers is also presented.
Lingua originaleEnglish
Titolo della pubblicazione ospiteProc. SPIE 6290, Laser Beam Shaping VII, 62900A (9 September 2006)
Numero di pagine9
Stato di pubblicazionePublished - 2006

All Science Journal Classification (ASJC) codes

  • ???subjectarea.asjc.2500.2504???
  • ???subjectarea.asjc.3100.3104???
  • ???subjectarea.asjc.1700.1706???
  • ???subjectarea.asjc.2600.2604???
  • ???subjectarea.asjc.2200.2208???

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