Memory effects in MOS capacitors with silicon quantum dots

Isodiana Crupi, Salvatore Lombardo, Yougui Liao, Yougui Liao, Michele Vulpio, Massimo Melanotte, Isodiana Crupi, Corrado Bongiorno, Barbara Fazio, Corrado Spinella, Cosimo Gerardi, Yougui Liao

Risultato della ricerca: Articlepeer review

2 Citazioni (Scopus)


To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon-rich oxide (SRO) by plasma-enhanced chemical vapor deposition of SiH4 and O2. Then the materials have been annealed in N2 ambient at temperatures between 950°C and 1100°C. Under such processing, the supersaturation of Si in the amorphous SRO film produces the formation of crystalline Si dots embedded in SiO2. The narrow dot size distributions, analyzed by transmission electron microscopy, are characterized by average grain radii and standard deviations down to about 1 nm. The memory functions of such structures has been investigated in MOS capacitors with a SRO film sandwiched between two thin SiO2 layers as insulator and with an n+ polycrystalline silicon gate. The operations of write and storage are clearly detected by measurements of hysteresis in capacitance-voltage characteristics. A model which explains both the occurence of steady-state conduction through the SiO2/SRO/SiO2 stack at a relatively low voltage and the shift of flat-band voltage is presented and discussed. © 2001 Elsevier Science B.V. All rights reserved.
Lingua originaleEnglish
pagine (da-a)283-285
Numero di pagine3
Stato di pubblicazionePublished - 2001

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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