TY - JOUR
T1 - Investigation on Metal–Oxide Graphene Field-Effect Transistors With Clamped Geometries
AU - Cusumano, Pasquale
AU - Stivala, Salvatore
AU - Arnone, Claudio
AU - Busacca, Alessandro
AU - Pernice, Riccardo
AU - Benfante, Antonio
AU - Giambra, Marco Angelo
AU - Calandra, Enrico
AU - Pernice, Wolfram H. P.
AU - Pernice, Wolfram H.P.
AU - Danneau, Romain
AU - Thurmer, Maximillian
AU - Thürmer, Maximillian
AU - Benz, Christian
AU - Wu, Fan
AU - Giambra, Marco A.
AU - Balachandran, Geethu
AU - Ahn, Jong-Hyun
AU - Pandey, Himadri
AU - Jang, Min-Ho
AU - Balachandran, Geethu
AU - Boopathi, Muraleetharan
AU - Balachandran, Geethu
AU - Boopathi, Muraleetharan
AU - Pandey, Himadri
PY - 2019
Y1 - 2019
N2 - In this work, we report on the design, fabrication and characterization of Metal-OxideGraphene Field-effect Transistors (MOGFETs) exploiting novel clamped gate geometries aimed at enhancingthe device transconductance. The fabricated devices employ clamped metal contacts also for source anddrain, as well as an optimized graphene meandered pattern for source contacting, in order to reduce parasiticresistance. Our experimental results demonstrate that MOGFETs with the proposed structure showimproved high frequency performance, in terms of maximum available gain and transition frequencyvalues, as a consequence of the higher equivalent transconductance obtained.
AB - In this work, we report on the design, fabrication and characterization of Metal-OxideGraphene Field-effect Transistors (MOGFETs) exploiting novel clamped gate geometries aimed at enhancingthe device transconductance. The fabricated devices employ clamped metal contacts also for source anddrain, as well as an optimized graphene meandered pattern for source contacting, in order to reduce parasiticresistance. Our experimental results demonstrate that MOGFETs with the proposed structure showimproved high frequency performance, in terms of maximum available gain and transition frequencyvalues, as a consequence of the higher equivalent transconductance obtained.
UR - http://hdl.handle.net/10447/377761
M3 - Article
SN - 2168-6734
VL - 7
SP - 964
EP - 968
JO - IEEE Journal of the Electron Devices Society
JF - IEEE Journal of the Electron Devices Society
ER -