Graphene Field-Effect Transistors Employing Different Thin Oxide Films: A Comparative Study

Alessandro Busacca, Salvatore Stivala, Riccardo Pernice, Marco Angelo Giambra, Antonio Benfante, Enrico Calandra, Wolfram H. P. Pernice, Romain Danneau, Christian Reitz, Filippo Fabbri, Vaidotas Miseikis, Marco A. Giambra, Filippo Fabbri, Filippo Fabbri, Ralph Krupke

Risultato della ricerca: Articlepeer review

9 Citazioni (Scopus)


In this work, we report on a comparison among graphene field-effect transistors (GFETs) employing different dielectrics as gate layers to evaluate their microwave response. In particular, aluminum oxide (Al2O3), titanium oxide (TiO2), and hafnium oxide (HfO2) have been tested. GFETs have been fabricated on a single chip and a statistical analysis has been performed on a set of 24 devices for each type of oxide. Direct current and microwave measurements have been carried out on such GFETs and short circuit current gain and maximum available gain have been chosen as quality factors to evaluate their microwave performance. Our results show that all of the devices belonging to a specific group (i.e., with the same oxide) have a well-defined performance curve and that the choice of hafnium oxide represents the best trade-off in terms of dielectric properties. Graphene transistors employing HfO2 as the dielectric layer, in fact, exhibit the best performance in terms of both the cutoff frequency and the maximum frequency of oscillation.
Lingua originaleEnglish
pagine (da-a)2256-2260
Numero di pagine5
RivistaACS Omega
Stato di pubblicazionePublished - 2019

All Science Journal Classification (ASJC) codes

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  • ???subjectarea.asjc.1500.1500???


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