Deposition of tin sulfide thin films from tin(IV) thiolate precursors

Giampaolo Barone, Ivan P. Parkin, Giampaolo Barone, Hibbert, Molloy, Hardy, Mahon, Field, Louise S. Price

Risultato della ricerca: Articlepeer review

64 Citazioni (Scopus)


AACVD (aerosol-assisted chemical vapour deposition) using (PhS)4Sn as precursor leads to the deposition of Sn3O4 in the absence of H2S and tin sulfides when H2S is used as co-reactant. At 450°C the film deposited consists of mainly SnS2 while at 500°C SnS is the dominant component. The mechanism of decomposition of (PhS)4Sn is discussed and the structure of the precursor presented.
Lingua originaleEnglish
pagine (da-a)464-468
Numero di pagine5
RivistaJournal of Materials Chemistry
Stato di pubblicazionePublished - 2001

All Science Journal Classification (ASJC) codes

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