Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

Yana Aleeva, Graziella Malandrino, Maria Elena Fragalà, Cristina Satriano, Yana Aleeva

Risultato della ricerca: Article

6 Citazioni (Scopus)

Abstract

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.
Lingua originaleEnglish
pagine (da-a)4484-4488
Numero di pagine5
RivistaThin Solid Films
Volume518
Stato di pubblicazionePublished - 2010

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Organic Chemicals
Organic chemicals
Lithography
metalorganic chemical vapor deposition
Chemical vapor deposition
lithography
Metals
catalysts
Catalysts
silver
Silver
optimization
thresholds
metals
temperature
Temperature

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cita questo

Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays. / Aleeva, Yana; Malandrino, Graziella; Fragalà, Maria Elena; Satriano, Cristina; Aleeva, Yana.

In: Thin Solid Films, Vol. 518, 2010, pag. 4484-4488.

Risultato della ricerca: Article

Aleeva, Yana ; Malandrino, Graziella ; Fragalà, Maria Elena ; Satriano, Cristina ; Aleeva, Yana. / Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays. In: Thin Solid Films. 2010 ; Vol. 518. pagg. 4484-4488.
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T1 - Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

AU - Aleeva, Yana

AU - Malandrino, Graziella

AU - Fragalà, Maria Elena

AU - Satriano, Cristina

AU - Aleeva, Yana

PY - 2010

Y1 - 2010

N2 - A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.

AB - A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.

KW - ZnO; Catalyst; Nanowires; Nanohole array; Colloidal lithography; MOCVD

UR - http://hdl.handle.net/10447/97154

M3 - Article

VL - 518

SP - 4484

EP - 4488

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -