Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

Yana Aleeva, Cristina Satriano, Yana Aleeva, Graziella Malandrino, Maria Elena Fragalà

Risultato della ricerca: Articlepeer review

6 Citazioni (Scopus)

Abstract

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.
Lingua originaleEnglish
pagine (da-a)4484-4488
Numero di pagine5
RivistaThin Solid Films
Volume518
Stato di pubblicazionePublished - 2010

All Science Journal Classification (ASJC) codes

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